Tempus AP-30
The Tempus™ AP-30, along with Intermolecular's application specific HPC Workflows and data informatics, accelerates the pace of unit-process development, materials integration, and serves as the bridge between R&D solutions and high-volume manufacturing. The AP-30 series utilizes a common 300mm cluster platform that can be configured for the specific application with multiple ALD (A-30) or PVD (P-30) chambers and common support modules such as degas and pre-clean. This combined functionality allows customers to take advantage of both atomic layer and physical vapor deposition for rapid screening of thin-film metal alloys, dielectrics and multilayer stacks, and for running process window studies and unit process optimization. In the later stages of material screening and process integration, processes may be scaled from site-isolated to full wafer deposition to facilitate scale-up to high-volume manufacturing.
ALD and PVD Workflow Systems
Combining HPC™ methodology with site-isolated deposition, our Tempus™ ALD/PVD workflows are being applied to materials screening and process integration development for applications involving metal or dielectric deposition. These systems address various technological challenges in both the solar and semiconductor device manufacturing processes.
Tempus P-30 HPC Physical Vapor Deposition
The P-30 is a 200mm and 300mm chamber with the ability to use up to four sources and three optional deposition methods (DC, pulsed DC and RF), the P-30 allows deposition of a vast range of conductors and dielectrics for memory and logic applications. Like the A-30, it features a rotating pedestal, which allows for film thickness and uniformity to be varied independently of the deposition site’s location.
Tempus A-30 HPC Atomic Layer Deposition
The A-30 is a 300mm chamber capable of site isolation of both metal and oxide films across four quadrants of the wafer, with easy variation of film thickness and/or composition within each quadrant. Each wafer quadrant can be addressed individually or processed in parallel with other quadrants, giving the user the ability to select any precursor flow and timing for each quadrant. Each A-30 chamber may be configured with up to four different ampoules, and is capable of handling both liquid and solid precursors. The A-30 also is equipped with a rotating pedestal, providing a simple means for introducing additional physical or compositional variation into the system. Current applications include initial precursor screening and characterization, as well as advanced materials discovery for applications like high-k dielectrics.
