wet workflow systems

Our Tempus™ systems for wet processing workflows apply Fast Forward Thinking to applications such as self-assembly processing, electroless deposition, wet etching and stripping, cleaning and surface preparation (for subsequent processes).

tempus-f10

Tempus F-10

This tool is a key part of the wet workflow that allows for precise automatic creation of formulations—especially those involving powders, viscous liquids and pH-measurement adjustment.

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Tempus f-20

Tempus F-20

Enabling massively parallel screening of materials and process, this tool is used for library creation as well as processing wafer coupons. It is ideal for primary and or secondary combinatorial screening, enabling the user to generate thousands of characterizations with reduced resource requirements. The Tempus F-20 supports testing on both coupons as well as within a vial block.

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Tempus F-30

Tempus F-30

This tool allows collection of comprehensive data sets from patterned wafers for integration and scale-up to high-volume manufacturing tools. It enables collection of comprehensive data sets from full-patterned wafers, allowing direct comparisons to current processes of record, and further reductions in development time and R&D costs.

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